提出了用一种半导体工业用双产品模型来研究基于机台和基于产品的控制方法。在此基础上,得到了闭环系统的输出,评估了控制性能。由于NH3的挥发类似于半导体工业的机台漂移,因此对纳米级SiO2粒子进行了实验研究。在氨溶液挥发的影响下制造不同大小的SiO2粒子,以模拟在机台干扰下生产不同产品。实验研究证实了理论结果,即基于机台的方法有时不稳定,而基于产品的方法是稳定的。
A novel two-product model for semiconductor industry was developed to investigate the "toolbased" and "product-based" approaches. The closed-loop responses were derived and control performances were evaluated. As the effect of ammonia vaporization was similar to the tool drifting, the experimental study of the preparation of nano scale Si02 particles was investigated. Different nano scale Si02 particles were produced by the effect of ammonia solution vaporization for simulating the process of different products produced under tool disturbance. The experimental study proves the validity of the theoretical analysis, the tool-based approach sometimes is unstable, while the product-based approach is stable.