中文摘要：

采用射频磁控溅射方法，在混合气氛下制备了ZrN／TaN多层膜．利用x射线衍射、慢正电子束分析、增强质子背散射、扫描电子显微镜，分别对ZrN／TaN多层膜中相结构、氦相关缺陷、氦含量、截面形貌等进行了分析．结果表明，调制周期为30nm的ZrN／TaN多层膜在600℃退火后，氦的保持率仍能达到45．6％．在适当的调制周期下，ZrN／TaN多层膜能够耐氦损伤并且其界面具有一定的固氦性能．

英文摘要：

In this paper, ZrN/TaN nano-multilayers are fabricated in mixing atmosphere by radio frequency magnetron sputtering. The phase structures, He-related defects, helium content and cross-section morphologies of ZrN/TaN nano-multilayers are characterized by X-ray diffraction, slow positron beam analysis, enhanced proton backscattering speetrome and scanning electron microscope, respectively. The results show that the interface of ZrN/TaN nano-multilayer with 30 nm modulation period is stable and could resist the damage of helium even annealed at 600 . The He retention rate of ZrN/TaN nano-multilayer with 30 nm modulation period can reach up to 45.6%.