对陶瓷球在双自转研磨盘研磨方式下的研磨均匀性进行仿真分析,表明研磨均匀性不仅取决于自旋角θ变化范围,而且取决于θ角的变化过程和球的自转角速度ωb的变化。对研磨均匀性来说,转速比函数幅值影响较大,相位的影响是很小,可以忽略。当内外下盘转速之比从0到2倍的进行连续周期变化时,可以得到较好的研磨均匀性,变化过程任意。
Through simulation analysis on lapping uniformity of ceramic balls under the dual rotating plates lapping mode, it can be indicated that the lapping uniformity not only depends on the variation range of spin angle θ, but also is determined by the variation form of θ and the spin angle speed of ball ωb Compared with the effects of amplitudes of the speed ratio function on the lapping uniformity, the effect of phase is much less. Under optimum amplitudes of the speed ratio function, better lapping uniformity is obtained.