中文摘要：

双自转研磨是一种获得高一致性精密球体的有效加工方法。为进一步提高双自转研磨方式下球面研磨轨迹的均匀性（研磨均匀性）,以提高球体加工球度及批一致性,建立了基于ADAMS的双自转研磨方式下球体运动仿真模型,分析了下研磨盘内外盘转速曲线对盘与球接触点（研磨轨迹点）分布的影响,对研磨盘转速曲线组合进行了优化,得到了＂双梯形-三角波＂研磨盘转速曲线组合。在此转速条件下,球面研磨轨迹均匀性的标准差S大幅减小（从1.4409μm减小到0.9748μm）。实验结果也表明：在相同实验条件下,同一批次的G28毛坯球（最大球形误差0.7μm）,经3h研磨,采用双梯形-三角波转速曲线比＂三角波＂转速曲线的球形误差降低0.168 72μm（从0.388 04μm减小到0.219 32μm）;同一批次的G10球（最大球形误差0.25μm）,经相同条件和时间研磨抛光,采用双梯形-三角波转速曲线比三角波转速曲线的球形误差减小0.0308μm（从0.103 64μm减小到0.072 78μm）,实验结果与仿真结果均证明了转速曲线的优化效果。

英文摘要：

RDP lapping mode is used to grind high--precision balls. In order to study the influ- ences of rotation speed of the lapping plates on the lapping uniformity, a numerical simulation model of RDP lapping mode was established based on multi--body dynamics analysis software ADAMS. Based on the simulation model,the influences of the speed curve of the lapping plate in lower plate on the distribution law of the contact points between the plate and the ball（lapping trace） was analyzed, and the speed curve was optimized, so the ＂double trapezoid--triangle＂（DTT） speed curve is get. The simulation results show that the standard deviation（S） of the lapping uniformity is effectively lower （from 1. 4409μm to 0. 9748μm） under the DTT speed curve condition. After 3 hours＇ lapping under the same experimental conditions, the average sphericity error reduces 0,168 72μm（frorn 0. 388 04μm to 0. 219 32μm） under the DTT speed curve conditions comparing with the original speed curve before optimization. In another lapping experiment, the average sphericity error reduces 0. 0308μm （from 0. 103 64μm to 0. 072 78μm） under the DTT speed curve conditions comparing with the original speed curve before optimization. The changing tendency of the test results is eonsistent with the simulation ones, which proves that the optimization is validity.