中文摘要：

采用磁控溅射方法，在不同的溅射气压（Ar气0．5-3．0Pa）条件下沉积纯金属Fe到Si（100）衬底上，通过真空退火炉在800℃对样品进行保温2h，直接形成了正交的β-FeSi2薄膜，利用X射线衍射（XRD）、扫描电镜（SEM）、椭偏光谱仪，对不同溅射气压下合成的β-FeSi2薄膜的结晶特性、表面形貌及光学性能进行表征，研究了不同溅射气压对制备β-FeSi2薄膜的影响。结果表明：在1．5Pa时能形成较好的β-FeSi2薄膜，临界溅射气压在2．0Pa附近，当溅射气压低与临界值时，β-FeSi2薄膜的成核密度较高，且成核密度随溅射气压的增大而降低；当溅射气压超过临界值以后，β-FeSi2薄膜的成核密度基本不变；薄膜的折射率n随压强的增大而增大，消光系数k随压强的增大而减小。

英文摘要：

In this paper using the magnetron sputtering method, the Fe tilms were deposited on Si（100） at didderent sputtering pressures （Ar 0.5-3.0Pa） , by then annealed at 800℃ for 2 h.The influence of sputtering pressure on the crystallinity and optical properties was studied by X-ray diffraction （XRD）, scanning electron microscope （SEM） and spectroscopic ellipsometry. The result show that the best β-FeSi2 films can be grown at 1.5Pa. The critical sputtering pressure is 2.0Pa ,when the sputtering pressure up to the critical sputtering pressure the density of β-FeSi2 grains is high grains and decline with the increasing of sputtering pressure. When the sputtering pressure exceeds the critical sputtering pressure the density of β-FeSi2 grains is roughtly a constant;the refractive index increas and the extinction coefficient diereas with the sputtering pressure of the increasing.