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A force-decoupled compound parallel alignment stage for nanoimprint lithography
  • ISSN号：0034-6748
  • 期刊名称：Review of Scientific Instruments
  • 时间：2013.12.12
  • 页码：-
  • 相关项目：具有压印力解耦功能的新型纳米压印平行对准系统关键技术研究
作者： Xiantao Sun|Weihai Chen|Rui Zhou|Wenjie Chen|Jianbin Zhang|
同期刊论文项目
具有压印力解耦功能的新型纳米压印平行对准系统关键技术研究
期刊论文 9 会议论文 16
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