中文摘要：

采用直流磁控溅射制备了不同调制波长的Ni/Al多层膜，利用X射线衍射技术（XRD）和纳米亚痕仪对薄膜微结构及力学性能进行了系统研究。结果表明，Ni/Al多层膜呈现纳米晶结构特征；同时，随调制波长减小，多层膜的硬度与“软”相的微结构特征参量具有相似变化规律，表明多层膜的变形机制对软膜的微结构约束存在敏感性。随薄膜特征尺度的减小，通过提出一个与软膜相关的新的表征参量（Lsub/d，L表示亚层厚，d表示晶粒尺寸，下标代表亚层），对多层膜晶界强化和膜界强化两种机制进行了协调统一，使薄膜变形在整个尺度范围内较好的符合Hall—Petch关系。

英文摘要：

Multilayered Ni/Al thin films with different wavelengths （L） on Si substrate were prepared by dc magnetron sputtering, along with the microstructural investigation and mechanically characterization by the employment of X-ray diffraction （XRD） and nanoindentaion. Experimental results show that Ni/Al multilayers exhibited nanocrystalline structures. Moreover, nanoindentation hardness and the related microstructural parameter in the softer sublayer revealed the similar variation tendency, which indicated the sensitivity of plastic behaviors on the microstructural constrains in softer layer. It is found that, in nanometer regime, by adopting a new parameter of Lsub/d in softer sublayer, the competition between grain-boundary and interfaee-boundary strengthening mechanisms would be unified. In the overall scale, the plastic deformation of nanomultilayers could follow the Hall-Petch relation with decreasing characteristic length scales.