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中文摘要：
研究了离子束溅射（IBS）制备的Nb2O5薄膜的光学特性、应力、薄膜微结构等特性,系统地分析了辅助离子源的离子束能量和离子束流对薄膜特性的影响.结果显示,在辅助离子源不同参数情况下,折射率在波长550nm处为2.310—2.276,应力值为-281—-152MPa.在合适的工艺参数下,消光系数可小于10-4,薄膜具有很好的表面平整度.与用离子辅助沉积（IAD）制备的薄膜相比,IBS制备的薄膜具有更好的光学特性和薄膜微结构.
英文摘要：
Optical properties,stress and microstructure of Nb2O5 thin films prepared by ion beam sputtering（IBS） are investigated,and the effects of assist ion beam energy and ion current on characteristics of Nb2O5 thin films are systematically discussed.The results show that with different parameters of assisted ion source,the refractive index changes from 2.310 to 2.276 and residual stress varies from-281MPa to-152 MPa.The extinction coefficient of Nb2O5 can be under 10-4,and the surface is very smooth in an optimum deposition condition.Thin films deposited by IBS exhibit better optical properties and microstructures than those deposited by ion assisted deposition（IAD）.
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