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Improved Ohmic contacts to plasma etched n-Al0.5Ga0.5N by annealing under nitrogen ambient before me
ISSN号:0021-8979
期刊名称:Journal of Applied Physics
时间:2013.3.3
页码:-
相关项目:非极性面ZnO/ZnCdO量子阱结构LED外延材料生长与器件制备研究
作者:
Zhang, Wei|Zhang, Jianbao|Wu, Zhihao|Chen, Shengchang|Li, Yang|Tian, Yu|Dai, Jiangnan|Chen, Changqing|Fang, Yanyan|
同期刊论文项目
非极性面ZnO/ZnCdO量子阱结构LED外延材料生长与器件制备研究
期刊论文 13
会议论文 3
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