中文摘要：

简单介绍了ICP(inductively coupled plasma)中的两种刻蚀工艺,阐述了以MEMS加工技术制备柔性仿壁虎刚毛阵列的方法,即利用ICP设备,采用低温(CRYO)工艺,在硅片上制作仿壁虎刚毛硅模版,然后注入有机硅胶成型,经剥离后得到柔性仿壁虎刚毛阵列.实验结果表明,该方法具有工艺实现简便、硅模版可重复使用的优点.场发射扫描电子显微镜SEM照片显示了直径2 μm、间距6 μm和直径5 μm、间距20 μm的柔性仿壁虎刚毛阵列.

英文摘要：

Two kind of inductively coupled plasma (ICP) etching techniques were briefly introduced. Especially, the technique of preparing the flexible biomimetic gecko setae arrays based on the technique of MEMS was emphatically illustrated, in which the ICP device and CYRO process are used to fabricate the template copying gecko setae on the silicon slice, then the organic silicon gel is injected into the template to form the model, the gel is lifted off to obtain the flexible imitating gecko setae arrays. The experimental results indicate that the technique is simple and the template can repeatedly used. Finally, the field emission scanning electron microscope images of the flexible biomimetic gecko setae arrays is given, whose diameters are 2 μm and 5 μm, and separation distances are 6 μm and 20 μm, respectively.