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MULTIAXIAL BEHAVIOR OF NANOPOROUS SINGLE CRYSTAL COPPER: A MOLECULAR DYNAMICS STUDY
  • ISSN号:0894-9166
  • 期刊名称:《固体力学学报:英文版》
  • 时间:0
  • 分类:TG146.11[金属学及工艺—金属材料;一般工业技术—材料科学与工程;金属学及工艺—金属学] TS57[轻工技术与工程—皮革化学与工程]
  • 作者机构:[1]The MOE Key Laboratory, School of Aerospace, Xi'an Jiaotong University, Xi'an 710049, China, [2]School of Engineering and Applied Science, Harvard University, Cambridge, Massachusetts 02138, USA, [3]Department of Engineering Mechanics, AML, Tsinghua University, Beijing 100084, China
  • 相关基金:Project supported by the National Natural Science Foundation of China (Nos.10425210 and 10832002), the National Basic Research Program of China (No.2006CB601202) and the National High Technology Research and Development Program of China (No.2006AA03Z519).
中文摘要:

压力紧张行为和 nanoporous 单身者水晶铜的早期的收益表面被分子的动力学(MD ) 学习方法。problemis 由一个周期的单位房间题目当模特儿到多轴的装载。装载导致的缺点进化被探索。早期的收益表面被发现是紧张压缩不对称。为给定的空体积部分,在收益表面的明显的尺寸效果被预言:更小表现更强壮。缺点的进化模式(即,脱臼和叠的差错) 对模型尺寸和空体积部分感觉迟钝。然而,它正在装载路径依赖者。当栈差错是为静水力学的压缩和单轴的紧张 / 压缩的主要缺点时,摆平的棱柱的脱臼环统治在静水力学的紧张下面的早期的让步。

英文摘要:

The stress-strain behavior and copper are studied by the molecular dynamics incipient yield surface of nanoporous single crystal (MD) method. The problem is modeled by a periodic unit cell subject to multi-axial loading. The loading induced defect evolution is explored. The incipient yield surfaces are found to be tension-compression asymmetric. For a given void volume fraction, apparent size effects in the yield surface are predicted: the smaller behaves stronger. The evolution pattern of defects (i.e., dislocation and stacking faults) is insensitive to the model size and void volume fraction. However, it is loading path dependent. Squared prismatic dislocation loops dominate the incipient yielding under hydrostatic tension while stacking-faults are the primary defects for hydrostatic compression and uniaxial tension/compression.

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期刊信息
  • 《固体力学学报:英文版》
  • 主管单位:
  • 主办单位:中国力学学会
  • 主编:郑泉水
  • 地址:武汉市珞喻路1037号华中科技大学南一楼西北508室
  • 邮编:430074
  • 邮箱:amss@mail.hust.edu.cn
  • 电话:027-87543737
  • 国际标准刊号:ISSN:0894-9166
  • 国内统一刊号:ISSN:42-1121/O3
  • 邮发代号:
  • 获奖情况:
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  • 被引量:133