在分子束外延系统中,利用3nm GaAs薄盖层将InAs自组装量子点部分覆盖,然后在500℃以及As2气氛中退火一分钟,制成纳米尺度的InAs量子环。这一形成敏感地依赖于退火时的生长条件和生长InAs自组装量子点时的淀积量。InAs在GaAs表面的扩散以及同时发生的In—Ga互混控制着InAs量子环的形成。
Nano-sized InAs quantum rings were fabricated on GaAs substrate by molecular beam epitaxy by partly capping the InAs self-resembled quantum dots (SAQDs) with 3 nm GaAs thin cap and annealing for 1 minute at 500℃ in As2 atmosphere. The formation of quantum rings sensitively depends on the annealing temperature and As pressure together with the initial sizes of the InAs SAQDs. The redistribution of InAs on the GaAs surface, together with the simultaneous In-Ga alloying controls the formation of quantum rings.