介绍了一种新型的、基于Cu牺牲层的聚酰亚胺图形化方法制备视网膜电极的MEMS工艺,并对其电化学性能进行了表征。该工艺创新性地以Cu作为衬底聚酰亚胺图形化的牺牲层,以PDMS(聚二甲基硅氧烷)作为剥离层,以聚酰亚胺作为封装材料,以惰性金属作为电极保护层材料,通过电铸、牺牲层和抛光打磨工艺,制备出可以自释放的柔性视网膜电极;随后,对器件进行封装,并对器件的表面形貌和电学性能进行了表征。视网膜电极器件厚度50μm,电路线宽50μm,阻抗10^4~10^5Ω。通过该工艺制得的人造视网膜电极具有柔软无伤害、生物相容以及低成本的优点。
A new MEMS fabrication process of artificial retina electrodes by the sacrificial-layerremoving method for the micro-patterning of PI was introduced. The electrochemical performance of the retina electrodes was characterized. The self release and flexible retina electrodes were fabricated through the electroform, sacrificial-layer-removing and polishing with the Cu sacrificial-layer, PDMS release layer, PI package material and inert metal electrode protective layer. Then, the devices were packaged, and the surface morphology and electrical performance were characterized. The thickness is 50 μm, the line width of the circuit is 50 μm, and the impedance is 10^4 - 10^5Ω. The retina electrodes have some characters such as flexibility, biocompatibility and low-cost.