总结了主要的欠电位沉积(upd)的原位研究方法,包括电化学研究方法(循环伏安(CV)、计时电流(CHR)和电化学阻抗谱(EIS))、界面分析方法(电化学石英晶体微天平(EQCM)和电化学扫描隧道显微镜/电化学原子力显微镜(ECSTM/ECAFM))及X射线分析技术(X射线吸收谱(XAS)和表面X射线散射(SXS))。根据这些研究方法,总结和探讨了许多体系的upd特征,分析了upd微观特征与宏观的测试结果的对应关系及其原理。此外,探讨了基于这些研究方法得出的关于upd的重要结论,并对比分析了上述研究方法的优缺点。在upd应用领域的研究方面,主要从四个方面进行了概述,涉及功能材料电合成、电分析应用、电化学原子层外延(ECALE)和表征贵金属(或纳米)材料电化学活性面积(ECSA),并简析了上述应用研究中涉及的关于upd过程的原理。最后,总结了upd研究方法和应用研究的现状并展望了其未来发展趋势。
A variety of primary in situ research techniques applied to underpotential deposition (upd) research, including electrochemical (cyclic voltammetry (CV), chronoamperometry (CHR), and electrochemical impedance spectroscopy (EIS)), interfacial (electrochemical quartz crystal microbalance (EQCM) and electrochemical scanning tunneling microscopy/electrochemical atomic force microscopy (ECSTM/ECAFM)) and X-ray based (X-ray absorption spectroscopy (XAS) and surface X-ray scattering (SXS)) analysis techniques, are summarized in this paper. We summarize and discuss the upd characteristics of many electrochemical systems as determined by these research techniques, and analyze the corresponding relationships and principles between the upd microscopic characteristics and macroscopic test results. Some conclusions of vital importance to upd drawn based on these techniques are explicitly discussed. Also, the merits and demerits of the above-mentioned research techniques are presented and compared. In the matter of application research areas of upd, four main aspects are summarized and analyzed:function materials' electrosynthesis, electroanalysis, electrochemical atomic layer epitaxy (ECALE), and electrochemical y active surface area (ECSA) characterization of noble metal (or nano) materials. Meanwhile, the principles involved in the aforementioned applications research related to upd process are briefly explained. Final y, with respect to both research techniques and application research, this paper reveals the current status of upd research and gives a bird's eye view of development trends.