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Photodetachment microscopy of a hydrogen negative ion in an electric field near a metal surface

ISSN号：1674-1056
期刊名称：《中国物理B：英文版》
时间：0
分类：O441.1[理学—电磁学;理学—物理] TG178[金属学及工艺—金属表面处理;金属学及工艺—金属学]
作者机构：[1]School of Physics and Optoelectronic Engineering, Ludong University, Yantai 264025, China
相关基金：Project supported by the National Natural Science Foundation of China （Grant Nos. 11074104 and 10604045） and the Higher Educational Science and Technology Program of Shandong Province, China （Grant No. J09LA02）.

关键词：金属表面, 氢负离子, 电场强度, 显微镜, 光剥离, 位置灵敏探测器, 电子能量, 通量分布, photodetachment microscopy, electron flux distribution, semi-classical theory

中文摘要：

According to the semi-classical theory, we study the photodetachment microscopy of H- in the electric field near a metal surface. During the photodetachment, the electron is photo-detached by a laser and the electron is drawn toward a position-sensitive detector. The electron flux distribution is measured as a function of position. Two classical paths lead the ion to any point in the classically allowed region on the detector, and waves traveling along these paths produce an interference pattern. If the metal surface perpendicular to the electric field is added, we find that the interference pattern is related not only to the electron energy and the electric-field strength, but also to the ion-surface distance. In addition, the laser polarization also has a great influence on the electron flux distribution. We present calculations predicting the interference pattern that may be seen in experiment. We hope that our study can provide a new understanding of the electron flux distribution of negative ions in an external field and surface, and can guide future experimental research on negative ion photo-detachment microscopy.

英文摘要：

According to the semi-classical theory, we study the photodetachment microscopy of H- in the electric field near a metal surface. During the photodetachment, the electron is photo-detached by a laser and the electron is drawn toward a position-sensitive detector. The electron flux distribution is measured as a function of position. Two classical paths lead the ion to any point in the classically allowed region on the detector, and waves traveling along these paths produce an interference pattern. If the metal surface perpendicular to the electric field is added, we find that the interference pattern is related not only to the electron energy and the electric-field strength, but also to the ion surface distance. In addition, the laser polarization also has a great influence on the electron flux distribution. We present calculations predicting the interference pattern that may be seen in experiment. We hope that our study can provide a new understanding of the electron flux distribution of negative ions in an external field and surface, and can guide future experimental research on negative ion photo-detachment microscopy.

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