中文摘要：

通过MC模型对射频容性Ar等离子体中离子入射的能量及其分布特性进行了模拟计算,结果表明,放电压力低时,高能量离子分布较多,且在高能区域分布曲线呈双峰形式,离子入射的角度较小;放电压力高时,低能量离子分布较多,能量分布曲线偏向于低能量区域,且高能峰消失,离子入射角度增大;放电电压升高,离子能量分布曲线向高能区域移动,能峰之间的距离变长,角度分布曲线向小角度区域移动;随着自偏压升高,入射离子的能量增大,能量分布曲线向高能量区域移动,能峰间距变化不大,离子入射角度减小。法拉第离子能量分析器的测试结果表明,低放电压力时,离子能量较高且在高能区域呈双峰形式,高放电压力时,离子能量较低且能量分布高能峰消失。

英文摘要：

A numerical simulation was done via the Monte Carlo model developed to investigate the incident ion energy and its distribution in the rf capacitative Ar plasma.The result showed that under low discharge pressure the ion energy distribution curve in high-energy region is characterized by bimodal with small ionic incident angle,where the ions are mainly of high-energy ones;while under high discharge pressure the curve moves into a low-energy region with increasing incident angle,where the high-energy peak disappears and the ions are mainly of low-energy ones.Such a result has also been verified by the Faraday＇s ionizing energy analyzer.In case the discharge voltage is increasing,the curve moves into a high-energy region with the spacing between peaks extended and the incident angle distribution curve moves into a small-angle region.Moreover,with the increasing self-bias,the incident ion energy increases and the energy distribution curve moves into a high-energy region without obvious change in the spacing between peaks and with decreasing ionic incident angle.