中文摘要：

采用热丝化学气相沉积技术制备微晶硅薄膜，利用X射线衍射谱、Raman散射谱、透射光谱和扫描电子显微镜等检测手段，系统地研究沉积过程中沉积气压对微晶硅薄膜晶粒尺寸、晶态比和光学带隙的影响，运用Tacu法则对薄膜的透射率和厚度进行计算分析，得到薄膜光学带隙与沉积气压之间的关系，结果表明薄膜的光学带隙随着沉积气压的升高而单调下降。

英文摘要：

Microcrystalline silicon thin films were deposited by HWCVD （hot-wire chemical vapor deposition） of which the structural and morphological properties were characterized by X-Ray Diffraction, Raman Spectrum, Transmittance Spectroscopy and Scanning Electron Microscope. The effects of gas pressure in HWCVD process on the grain size, crystalline ratio and optical band gap of the microcrystalline silicon films deposited under different conditions were studied systematically. The transmittances and thickness of thin films were calculated with Tacu law, and the results indicated that the values of optical band gap decrease with increasing gas pressure in HWCVD process.