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Simulations of structures of amorphous Si x C1-x films
  • ISSN号：0169-4332Electronic Resource Number: 10.1016/s0169-4332(03)00702-5
  • 期刊名称：Applied Surface Science
  • 时间：0
  • 页码：894-897
  • 语言：英文
  • 相关项目：硅含量对无定形碳化硅薄膜的结构和摩擦学性能的影响
作者： Wang, Yang|Liu, Can|Lan, Huiqing|
同期刊论文项目
硅含量对无定形碳化硅薄膜的结构和摩擦学性能的影响
期刊论文 26 会议论文 8 专利 1
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