采用溶胶-凝胶与喷雾热解相结合的方法,在大面积浮法玻璃基板上制备出了SnO2:Sb+F透明导电薄膜,研究了F/Sn比例、基板温度与SnO2薄膜的结构、形貌、光电性能的关系。实验结果表明:在溶胶的Sn:Sb:F比例为1:0.04:0.5和基板温度550℃的条件下,制备的SnO2:Sb+F薄膜具有最佳的导电性能及较高的透光率,薄膜方阻达25Ω/□,电阻率为7.5×10^-4Ω·cm,平均可见光透过率为77.4%,辐射率e=0.208,表现出了较好的低辐射性。
A transparent conducting thin film of SnO2:Sb + F was prepared by Sol - Gel joint spray pyrolysis method on large area float glass. The relationship between F/Sn ratio, substrate temperature and structure, morphology of SnO2:Sb + F film as well as its photoelectric performances were studied. Results show that, at the substrate temperature of 550℃ and Sn: Sb: F = 1 :0.04:0. 5 in solution, the optimal conductivity and well transmittance of the film can be obtained. In this case, SnO2:Sb + F film coated on the float glass with 25Ω/□ of the square resistance, 7.5 ×10^-4 Ω· cm of the resistivity , 77.4% of average transmittance at the range of visible light, as well as 0. 208 of emissivity was obtained which shows well low emission.