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Elimination of Surface Scratch / Texture on the Surface of Single Crystal Si Substrate in Chemo-mech
  • ISSN号：0169-4332
  • 期刊名称：Applied Surface Science
  • 时间：0
  • 页码：4205-4211
  • 语言：英文
  • 相关项目：超薄硬脆晶体基片的耦合能量软磨机理与关键技术研究
作者： J. Shimizu|Y. Tashiro|Y.B. Tian|R.K. Kang|L. Zhou|
同期刊论文项目
超薄硬脆晶体基片的耦合能量软磨机理与关键技术研究
期刊论文 7 专利 2
同项目期刊论文
Characteristics of the Wheel Surface Topography in Ultra-precision Grinding of Silicon Wafers
Material Removal Mechanism of Chemo-mechanical Grinding (CMG) of Si Wafer by Using Soft Abrasive Gri
Study on Grinding Performance of Soft Abrasive Wheel for Silicon Wafer
A novel single step thinning process for extremely thin Si wafers
Study on Subsurface Damage Model of the Ground Monocrystallinge Silicon Wafers
应用软磨料磨削的单晶硅超精密制造技术