位置：成果数据库 > 期刊 > 期刊详情页
Helicon plasma discharge for processing wall material
  • 期刊名称：Applied Mechanics and Materials
  • 时间：2014.2.6
  • 页码：28-32-
  • 相关项目：螺旋波等离子体特性及与材料相互作用基础研究
作者： T.Y. Huang, C.G. Jin, M.Z. Wu, L.J. Zhuge|
同期刊论文项目
螺旋波等离子体特性及与材料相互作用基础研究
期刊论文 19 会议论文 8 著作 1
同项目期刊论文
生长温度对热蒸发法制备ZnO纳米线的结构与发光性能影响
激光诱导荧光在低温等离子体诊断中的应用
高密度螺旋波等离子体源的应用进展
Effect of Multiple Frequency H2/Ar PlasmaTreatment on the Optical, Electrical, andStructural Propert
Annealing temperature dependence of interface characteristic and？energy-band alignment in ultra-thin
Broadband and omnidirectional antireflection of SiN composite nanostructures–decorated Si surface fo
Structure, optical properties and thermal stability of HfErO filmsdeposited by simultaneous RF and V
Synthesis of Few-Layer Graphene-on-InsulatorFilms by Controllable C4F8 Plasma Etching SiC
Electrical properties improvement of high-k HfO2 films by combination of C4F8 dual-frequency capacit
二维点缺陷等离子体光子晶体缺陷模特性研究
螺旋波等离子体合成SiON薄膜及其特性
Rapidly Synthesis of Nanocrystalline Diamond Films by Helicon Wave Plasma
Effect of Low-Frequency Power on Etching Characteristics of 6H-SiC in C4F8/Ar Dual-Frequency Capacitively Coupled Plasma
Experimental Characterization of Dual-Frequency Capacitively Coupled Plasma with Inductive Enhancement in Argon