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Electrical properties improvement of high-k HfO2 films by combination of C4F8 dual-frequency capacit
  • ISSN号：0169-4332
  • 期刊名称：Applied Surface Science
  • 时间：2014.8.30
  • 页码：117-123
  • 相关项目：螺旋波等离子体特性及与材料相互作用基础研究
作者： Yang, Y.|He, H. J.|Zhuge, L. J.|Wu, X. M.|
同期刊论文项目
螺旋波等离子体特性及与材料相互作用基础研究
期刊论文 19 会议论文 8 著作 1
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