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Influence of the SiO2 gate insulator thinness to the performance and Bias –voltage stress stability
  • 期刊名称：J. Optoelectronics and Advanced materials
  • 时间：2011.7.7
  • 页码：797-801
  • 相关项目：微晶硅TFT-OLED的若干基础问题的研究
作者： F. Zhou|H.P. Lin|J. Li|L. Zhang|X.W Zhang|D. B. Yu|X.Y. Jiang|Z.L. Zhang|J.H .Zhang|
同期刊论文项目
微晶硅TFT-OLED的若干基础问题的研究
期刊论文 23 专利 1
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