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A tunneling piezoresistive model for polysilicon
  • ISSN号:1674-4926
  • 期刊名称:《半导体学报:英文版》
  • 时间:0
  • 分类:TP212[自动化与计算机技术—控制科学与工程;自动化与计算机技术—检测技术与自动化装置] TN304.12[电子电信—物理电子学]
  • 作者机构:[1]Information Science and Engineering School, Shenyang University of Technology, Shenyang 110023, China, [2]Department of Microelectronics, Harbin Institute of Technology, Harbin 150001, China
  • 相关基金:Project supported by the National Natural Science Foundation of China (No. 60776049), the Science and Technology Foundation of Liao- ning Province (No. 20072036), and the Fund of Liaoning Province Education Department (No. 2007T130).
中文摘要:

<正>Based on the trap model,the band structure and the conductive mechanism of polysilicon were analyzed, and then an equivalent circuit used to interpret the tunneling piezoresistive effect was proposed.Synthesizing the piezoresistive effect of the grain boundary region and grain neutral zone,a new piezoresistive model—a tunneling piezoresistive model is established.The results show that when the doping concentration is above 1020 cm-3,the piezoresistive coefficient of the grain boundary is higher than that of the neutral zone,and it increases with an increase in doping concentration.This reveals the intrinsic mechanism of an important experimental phenomena that the gauge factor of heavily doped polysilicon nano-films increases with an increase in doping concentration.

英文摘要:

Based on the trap model, the band structure and the conductive mechanism ofpolysilicon were analyzed, and then an equivalent circuit used to interpret the tunneling piezoresistive effect was proposed. Synthesizing the piezoresistive effect of the grain boundary region and grain neutral zone, a new piezoresistive model--a tunneling piezoresistive model is established. The results show that when the doping concentration is above 10^20 cm^-3, the piezoresistive coefficient of the grain boundary is higher than that of the neutral zone, and it increases with an increase in doping concentration. This reveals the intrinsic mechanism of an important experimental phenomena that the gauge factor of heavily doped polysilicon nano-films increases with an increase in doping concentration.

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期刊信息
  • 《半导体学报:英文版》
  • 中国科技核心期刊
  • 主管单位:中国科学院
  • 主办单位:中国电子学会 中国科学院半导体研究所
  • 主编:李树深
  • 地址:北京912信箱
  • 邮编:100083
  • 邮箱:cjs@semi.ac.cn
  • 电话:010-82304277
  • 国际标准刊号:ISSN:1674-4926
  • 国内统一刊号:ISSN:11-5781/TN
  • 邮发代号:2-184
  • 获奖情况:
  • 90年获中科院优秀期刊二等奖,92年获国家科委、中共中央宣传部和国家新闻出版署...,97年国家科委、中共中央中宣传部和国家新出版署三等奖,中国期刊方阵“双效”期刊
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  • 俄罗斯文摘杂志,美国化学文摘(网络版),荷兰文摘与引文数据库,美国工程索引,美国剑桥科学文摘,英国科学文摘数据库,日本日本科学技术振兴机构数据库,中国中国科技核心期刊,中国北大核心期刊(2004版),中国北大核心期刊(2008版),英国英国皇家化学学会文摘,中国北大核心期刊(2000版)
  • 被引量:7754