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Effect of pH on Material Removal Rate of Cu in Abrasive Free Polishing
  • ISSN号：0013-4651
  • 期刊名称：JOURNAL OF THE ELECTROCHEMICAL SOCIETY
  • 时间：0
  • 页码：H176-H180
  • 语言：英文
  • 相关项目：化学机械组合作用功能粒子及其超精抛光机理研究
作者： Liu Yuhong|Zhang Wei| Pan Guoshun|Lu Xinchun|
同期刊论文项目
化学机械组合作用功能粒子及其超精抛光机理研究
期刊论文 17 会议论文 9 获奖 2 专利 11
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