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Effects of Annealing Processes on CuxSi(1-x) Thin Films
  • ISSN号:1000-2413
  • 期刊名称:《武汉理工大学学报:材料科学英文版》
  • 分类:O643.36[理学—物理化学;理学—化学] X703[环境科学与工程—环境工程]
  • 作者机构:State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China
  • 相关基金:Funded by the National Science Foundation of China (U12301013) and the National Science Foundation of China (51521001)
中文摘要:

BiVO 4光催化剂被表面活化剂综合免费热水的方法没有更进一步处理,并且由X光检查衍射( XRD )描绘了,扫描电子显微镜学( SEM ),传播电子显微镜学( TEM ),紫外可见的弥漫的反射光谱学(紫外力的医生),拉曼光谱学,并且 Brunauer-Emmett-Teller (赌注)表面区域技术。photocatalytic 活动在可见轻照耀下面为甲又蓝色(MB ) 的降级被评估。从结构、词法的描述看,获得的样品介绍单斜晶的阶段,和 pH 价值,这被说在形态学上有重要影响。提高的 photocatalytic 表演与它的 crystallinity,唯一的形态学,乐队差距精力,赌的特定的表面区域,表面费用和吸附能力被联系。BiVO 4 光催化剂举办的 recycle 实验结果表演优秀相片稳定性,和我们由检验为 MB photocatalytic 涉及 photocatalytic 过程的活跃种类的效果推出了可能的机制降级。

英文摘要:

BiVO4 photocatalysts were synthesized by a surfactant free hydrothermal method without any further treatments,and characterized by X-ray diffraction(XRD),scanning electron microscopy(SEM),transmission electron microscopy(TEM),ultraviolet-visible diffuse reflectance spectroscopy(UV-vis DRS),Raman spectroscopy,and Brunauer-Emmett-Teller(BET) surface area techniques.The photocatalytic activity was evaluated for the degradation of the methylene blue(MB) under visible light irradiation.Seen from the structural and morphological characterization,it is stated that the obtained samples present monoclinic phase,and the pH value has significant influence on the morphologies.The enhanced photocatalytic performance was associated with its crystallinity,unique morphology,band gap energy,BET specific surface area,surface charge and adsorption capacity.The recycle experiments results show that the BiVO4 photocatalysts have excellent photo-stability,and we deduced a possible mechanism by examining the effects of the active species involved in the photocatalytic process for MB photocatalytic degradation.

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期刊信息
  • 《武汉理工大学学报:材料科学英文版》
  • 中国科技核心期刊
  • 主管单位:
  • 主办单位:武汉理工大学
  • 主编:
  • 地址:武汉市洪山区珞狮路122号
  • 邮编:430070
  • 邮箱:jwutms@mail.whut.edu.cn
  • 电话:027-87384113 87651870
  • 国际标准刊号:ISSN:1000-2413
  • 国内统一刊号:ISSN:42-1680/TB
  • 邮发代号:38-78
  • 获奖情况:
  • 国内外数据库收录:
  • 被引量:149