采用氯化铵(NH4Cl)溶液对磁控溅射技术制备的掺铝氧化锌(A2O)薄膜进行表面织构,并对其表面织构机制进行研究。研究结果表明NH4Cl溶液优先与间隙锌、间隙铝等缺陷和晶界处的堆积铝反应,而较大的相对应力和稀疏表面有助于间隙锌、间隙铝等缺陷和堆积铝的形成。它们对NH4Cl对A2O薄膜的表面织构很关键。
The as-deposited Al-doped zinc oxide(AZO) transparent and conductive films by magnetron sputtering technique were textured by NH4Cl aqueous solution and the surface texture mechanism of AZO films was investigated. The results indicated that NH4Cl aqueous solution may firstly react with interstitial Zn,interstitial Al and stacked Al at the grain boundary,which was easily induced by a relative large film stress and smaller film compactness. The formation of interstitial Zn,interstitial Al and the grain boundary is the key to realize effective Surface texture.