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掺铝氧化锌薄膜表面织构机制的研究
  • 期刊名称:功能材料
  • 时间:0
  • 页码:1678-1681
  • 语言:中文
  • 分类:TN304.055[电子电信—物理电子学] TN305.2[电子电信—物理电子学]
  • 作者机构:[1]郑州大学物理工程学院材料物理教育部重点实验室,河南郑州450052
  • 相关基金:国家自然科学基金资助项目(60807001)
  • 相关项目:适合光存储和磁光存储的氧化银薄膜热稳定性和短波响应研究
中文摘要:

采用氯化铵(NH4Cl)溶液对磁控溅射技术制备的掺铝氧化锌(A2O)薄膜进行表面织构,并对其表面织构机制进行研究。研究结果表明NH4Cl溶液优先与间隙锌、间隙铝等缺陷和晶界处的堆积铝反应,而较大的相对应力和稀疏表面有助于间隙锌、间隙铝等缺陷和堆积铝的形成。它们对NH4Cl对A2O薄膜的表面织构很关键。

英文摘要:

The as-deposited Al-doped zinc oxide(AZO) transparent and conductive films by magnetron sputtering technique were textured by NH4Cl aqueous solution and the surface texture mechanism of AZO films was investigated. The results indicated that NH4Cl aqueous solution may firstly react with interstitial Zn,interstitial Al and stacked Al at the grain boundary,which was easily induced by a relative large film stress and smaller film compactness. The formation of interstitial Zn,interstitial Al and the grain boundary is the key to realize effective Surface texture.

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