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ECR等离子体对单晶硅的低温大面积表面处理
  • 期刊名称：半导体学报
  • 时间：0
  • 作者或编辑：3448
  • 第一作者所属机构：复旦大学
  • 页码：2000，21（10），1019-1023
  • 语言：中文
  • 相关项目：纳米GaN嵌镶薄膜的光发射和光学非线性
作者： 孙剑|吴嘉达|钟晓霞等|
同期刊论文项目
纳米GaN嵌镶薄膜的光发射和光学非线性
期刊论文 12 会议论文 3 获奖 2
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用脉冲激光沉积方法制备氮化铝薄膜
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以GaAs为原材料低温制备GaN薄膜
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