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Atomic layer deposition of ZnO on thermal SiO2 and Si surfaces using N-2-diluted diethylzinc and H2O
  • ISSN号：0169-4332
  • 期刊名称：Applied Surface Science
  • 时间：2012.3.3
  • 页码：4657-4666
  • 相关项目：高密度金属/绝缘体/金属电容的电压系数调制及性能退化机理
作者： Ke-Jia Qian|Sun Chen| Bao Zhu|Lin Chen|Shi-Jin Ding|Hong-Liang Lu|Qing-Qing Sun|David Wei Zhang|Zhenyi Chen|
同期刊论文项目
高密度金属/绝缘体/金属电容的电压系数调制及性能退化机理
期刊论文 12
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