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Thermal stability of atomic-layer-deposited ultra-thin niobium oxide film on Si (100)
  • ISSN号：0169-4332
  • 期刊名称：Applied Surface Science
  • 时间：2011.4.4
  • 页码：7305-7309
  • 相关项目：高密度金属/绝缘体/金属电容的电压系数调制及性能退化机理
作者： Yue Huang|Yan Xu|Shi-Jin Ding|Hong-Liang Lu|Qing-Qing Sun|David Wei Zhang|Zhenyi Chen|
同期刊论文项目
高密度金属/绝缘体/金属电容的电压系数调制及性能退化机理
期刊论文 12
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