中文摘要：

在不同溅射压强下,通过射频（RF）磁控溅射在石英玻璃衬底上沉积得到W掺杂ZnO薄膜（WZO）。对样品的结晶性能,表面形貌和光学性能进行测试分析,结果表明：在适当溅射压强下,薄膜具有良好的结晶性和光学性能。随着溅射压强的增加,薄膜的结晶性先变好后变差,晶粒尺寸先增大后减小,在1.0 Pa时薄膜的结晶性最好,且晶粒尺寸最大,约为32 nm;所有WZO薄膜样品的平均透光率超过80%;光致发光主要由本征发光和缺陷引起的蓝光发光组成,在1.0 Pa时薄膜还有明显的Zni缺陷,在1.2 Pa时薄膜有明显的Oi缺陷。

英文摘要：

W-doped ZnO thin films（ WZO） were deposited on quartz glass substrate at different sputtering pressures by RF magnetron sputtering. The effects of sputtering pressures on the structural,morphology and optical were investigated. The results show that the proper sputtering pressure is helpful to increase crystallization property and optical property. As sputtering pressures increased,the crystallization property of the films became better at first,then to worse. The grain size became bigger then to smaller. The film at 1. 0 Pa has best crystallization property and biggest grain size,the size is approximate to 32 nm. All the samples have good optical transmittance,the average results are more than 80%. Photoluminescence is mainly caused by intrinsic and defects. Moreover,the film of 1. 0 Pa and 1. 2 Pa has obvious defect of Zn_i and O_i respectively.