中文摘要：

采用恒电流电化学技术，在一定浓度B0（OH）2溶液中，于室温环境下在金属钨片上制备了BaWO4多晶薄膜。利用XRD和SEM测试手段分析表征了薄膜的晶相和表面形貌；对比讨论了金属钨片表面质量、电流密度以及溶液浓度对沉积薄膜的表面形貌及晶粒生长形态的影响。研究表明，在本实验条件下制得的BawO4多晶薄膜均具有单一的四方相结构；村底表面质量对沉积薄膜的表面平整度有很大的影响；电流密度的大小影响晶粒几何尺寸；晶粒显露面族及几何外形因溶液浓度的改变而变化。

英文摘要：

Using a constant direct current technique,crystallized BaWO4 films with scheelite-structure have been prepared on anodic tungsten substrates in Ba（OH）2 solutions at room temperature. The deposited films were characterized by XRD and SEM technique, and effects of processing conditions （substrates quality, current density and solution concentration） on the growing characteristics of films have been discussed. The research results indicated that BaWO4 films prepared in our experiments were all tetragonal phase; the qualities of as-grown films relied on the roughness of substrate surface;current density affected size of the crystalline grains;and the solution concentration influenced the appearance of film grains.