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Electroless deposition of W-doped Ag films onto p-Si（100） from diluted HF solution
  • ISSN号：1003-6326
  • 期刊名称：《中国有色金属学报：英文版》
  • 时间：0
  • 分类：O484.1[理学—固体物理;理学—物理] TQ153.2[化学工程—电化学工业]
  • 作者机构：[1]State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China, [2]Department of Chemistry, Lanzhou University, Lanzhou 730000, China
  • 相关基金：Projects（50721062; 50835009） supported by the National Natural Science Foundation of China
作者： 叶为春[1], 马传利[2], 王春明[2], 周峰[1]
关键词： 化学沉积, 钨掺杂, 硅(100), 银膜, X射线光电子能谱, 溶液, HF, 稀释, autocatalytic electroless deposition, W-doped Ag film, silicon, HF
中文摘要：

做钨的银电影被沉浸终止氢的硅晶片进 2.5 mmol/L 的答案准备[Ag2WO4 ] 在 50 琠潷椠瑮牥慮? 牦捩楴湯瀠慥獫漠 ? 桴 ? 灳 ' 毯茰Ｃ郀?潣普物敭 ? 潣牲獥潰摮湩 ? 潴琠敨爠癥牥敳琠慲獮潦浲瑡潩 ? 景吠乩 ? 的 +0.1 mol/L HF ? 湡 ?楔楎?金挠浯潰敮瑮?敲灳'虡N敶祬.?吗？？

英文摘要：

Tungsten-doped silver films were prepared by immersing hydrogen-terminated silicon wafers into the solution of 2.5 mmol/L [Ag2WO4]＋0.1 mol/L HF at 50 ℃. Their growth and composition were characterized with atomic force microscopy and X-ray photoelectron spectroscopy, respectively. The effect of tungstate ions on the deposition of silver was investigated by X-ray diffraction （XRD） and scanning electron microscopy （SEM） by comparing W-doped Ag film with Ag film. It is found that the molar fraction of tungsten in the deposits is about 2.3% and the O to W molar ratio was about 4.0 and W-doped Ag films have good anti-corrosion in air at 350 ℃. The doping of tungsten cannot change the deposition of silver.

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期刊信息
  • 《中国有色金属学报：英文版》
  • 中国科技核心期刊
  • 主管单位:中国科学技术协会
  • 主办单位:中国有色金属学会
  • 主编：黄伯云
  • 地址：中国长沙中南大学
  • 邮编：410083
  • 邮箱：f-xsxb@csu.edu.cn
  • 电话：0731-88830949
  • 国际标准刊号：ISSN：1003-6326
  • 国内统一刊号：ISSN：43-1239/TG
  • 邮发代号:42-317
  • 获奖情况:
  • 国家“双百”期刊,第二届全国优秀科技期刊评比二等奖,中国有色金属工业总公司优秀科技期刊一等奖
  • 国内外数据库收录:
  • 俄罗斯文摘杂志,美国化学文摘（网络版）,荷兰文摘与引文数据库,美国工程索引,美国剑桥科学文摘,美国科学引文索引（扩展库）,英国科学文摘数据库,日本日本科学技术振兴机构数据库,中国中国科技核心期刊
  • 被引量:1159