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指数掺杂GaAs光电阴极分辨力特性分析
  • ISSN号:1000-3290
  • 期刊名称:物理学报
  • 时间:0
  • 页码:5842-5846
  • 语言:中文
  • 分类:TN15[电子电信—物理电子学] TP393.1[自动化与计算机技术—计算机应用技术;自动化与计算机技术—计算机科学与技术]
  • 作者机构:[1]Institute of Electronic Engineering and Optoelectronic Technology,Nanjing University of Science and Technology, Nanjing 210094, China
  • 相关基金:Project supported by the National Natural Science Foundation of China (Grant Nos. 60801036 and 61067001); the Key Science and Technology Project of Henan Province of China (Grant No. 112102210202); and the Research and Innovation Plan for Graduate Students of Jiangsu Higher Education Institutions of China (Grant No. CX09B_096Z).
  • 相关项目:变掺杂GaAs光阴极材料与量子效率理论研究
中文摘要:

<正>Two types of transmission-mode GaAs photocathodes grown by molecular beam epitaxy are compared in terms of activation process and spectral response,one has a gradient-doping structure and the other has a uniform-doping structure.The experimental results show that the gradient-doping photocathode can obtain a higher photoemission capability than the uniform-doping one.As a result of the downward graded band-bending structure,the cathode performance parameters,such as the electron average diffusion length and the surface electron escape probability obtained by fitting quantum yield curves,are greater for the gradient-doping photocathode.The electron diffusion length is within a range of from 2.0 to 5.4μm for doping concentration varying from 1019 to 1018 cm-3 and the electron average diffusion length of the gradient-doping photocathode achieves 3.2μm.

英文摘要:

Two types of transmission-mode GaAs photocathodes grown by molecular beam epitaxy are compared in terms of activation process and spectral response, one has a gradient-doping structure and the other has a uniform-doping structure. The experimental results show that the gradient-doping photocathode can obtain a higher photoemission capability than the uniform-doping one. As a result of the downward graded band-bending structure, the cathode performance parameters, such as the electron average diffusion length and the surface electron escape probability obtained by fitting quantum yield curves, are greater for the gradient-doping photocathode. The electron diffusion length is within a range of from 2.0 to 5.4μm for doping concentration varying from 10^19 to 10^18 cm^-3 and the electron average diffusion length of the gradient-doping photocathode achieves 3.2 μm.

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期刊信息
  • 《物理学报》
  • 北大核心期刊(2011版)
  • 主管单位:中国科学院
  • 主办单位:中国物理学会 中国科学院物理研究所
  • 主编:欧阳钟灿
  • 地址:北京603信箱(中国科学院物理研究所)
  • 邮编:100190
  • 邮箱:apsoffice@iphy.ac.cn
  • 电话:010-82649026
  • 国际标准刊号:ISSN:1000-3290
  • 国内统一刊号:ISSN:11-1958/O4
  • 邮发代号:2-425
  • 获奖情况:
  • 1999年首届国家期刊奖,2000年中科院优秀期刊特等奖,2001年科技期刊最高方阵队双高期刊居中国期刊第12位
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  • 美国化学文摘(网络版),荷兰文摘与引文数据库,美国工程索引,美国科学引文索引(扩展库),英国科学文摘数据库,日本日本科学技术振兴机构数据库,中国中国科技核心期刊,中国北大核心期刊(2004版),中国北大核心期刊(2008版),中国北大核心期刊(2011版),中国北大核心期刊(2014版),中国北大核心期刊(2000版)
  • 被引量:49876