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Nitrogen-rich titanium nitride serving as pt-al diffusion barrier for feram application
  • ISSN号：1058-4587
  • 期刊名称：Integrated Ferroelectrics
  • 时间：0
  • 页码：19-26
  • 语言：英文
  • 相关项目：面向新型铁电DRAM的关键材料及MFIS界面特性研究
作者： Liu, Li-Tian|Jia, Ze|Xie, Dan|Zhang, Ming-Ming|Xue, Kan-Hao|Ren, Tian-Ling|
同期刊论文项目
面向新型铁电DRAM的关键材料及MFIS界面特性研究
期刊论文 13 会议论文 4 专利 3
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