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Etching behavior and damage rejuvenation of top electrode and Bi 3:15Nd0:85Ti3O12 films applied in f
  • ISSN号：0021-4922
  • 期刊名称：Japanese Journal of Applied Physics
  • 时间：0
  • 页码：0502091-0502093
  • 语言：英文
  • 相关项目：面向新型铁电DRAM的关键材料及MFIS界面特性研究
作者： Xie, Dan|Xue, Kanhao|Ren, Tianling|Liu, Litian|Yu, Wenkao|Luo, Yafeng|
同期刊论文项目
面向新型铁电DRAM的关键材料及MFIS界面特性研究
期刊论文 13 会议论文 4 专利 3
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