目前在高密度磁记录薄膜中大量使用到CoCrPt系溅射靶材。重点介绍了CoCrPt系磁性靶材国内外发展现状,靶材制备中的主要工艺以及质量控制内容和方法,最后分析了存在的技术难点和需要解决的问题。
The CoCrPt system sputtering target has been widely used in high density of layer thin-film magnetic recording storage media preparation. The research progress on CoCrPt system sputtering targets was summarized from resent relevant patents and reports. The process and preparation methods of those magnetic sputtering targets were mainly discussed and analyzed. The key points of target's quality control were listed and studied in detail. At last, important technology problems and main difficulties which occurred in CoCrPt system sputtering target were discussed.