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中文摘要：
采用荧光分析,暂态光电流响应分析,电化学交流阻抗谱（EIS）和Mott-Schottky响应分析考察了外加电位,光照时间,溶液pH等几个关键因素对光诱导约束刻蚀体系中TiO2纳米管阵列表面游离·OH 生成的影响.结果表明：当外加电位为1.0V时,光电协同产生游离·OH 效率最高;·OH 的光催化生成与消耗能很快达到稳态,形成稳定的约束刻蚀剂层,有利于保持刻蚀过程中的精度;当pH为10时,TiO2纳米管光催化产生游离·OH 效率最高.研究结果对于调控和优化光诱导约束刻蚀平坦化铜的溶液体系,提高铜的刻蚀速度或平坦化精度有重要的指导意义.
英文摘要：
In this paper, we studied the formation of free ~ OH on a TiO2 nanotube array electrode in a photo-induced confined etching system. We used fluorescence spectroscopy, transient photocurrent response, electrochemical impedance spectroscopy （EIS）, and Mott-Schottky analysis to investigate the influence of several key factors, including the applied potential, the illumination time, and the pH value. The highest efficiency for the photoelectrocatalytic formation of free ~ OH on the TiO2 nanotube array electrode was achieved at an applied potential of 1.0 V （vs a saturated calomel electrode （SCE））; the photoelectrocatalytic generation and consumption of free ~ OH quickly approached a steady state in this system, as the confined etching layer formed by ~ OH remained stable during illumination. This may allow good control of the etching precision during continuous etching processes. The highest efficiency for the photoelectrocatalytic formation of free ~ OH on the TiO2 nanotube array electrode was observed at pH 10. The results have an important significance for regulating and optimizing photo-induced confined etching system, which can be used to improve the etching speed or the leveling precision during the planarization of copper.
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