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中文摘要：
采用射频磁控反应溅射法结合热退火处理技术制备纳米硅镶嵌氮化硅（ncSi-SiNx）复合薄膜。通过X射线能谱（EDS）、X射线衍射仪（XRD）的测定,对薄膜进行了结构及所包含硅晶粒大小的表征。采用皮秒激光器运用单光束Z扫描技术开展了对该复合薄膜的非线性光学性质的研究,测得其三阶非线性折射率系数和非线性光吸收系数分别为10-8esu和10-8m/W量级,并将薄膜这种三阶光学非线性的增强归因于量子限域效应。
英文摘要：
The silicon nitride （ncSi-SiNx） composite films with nanocrystal-Si-particle were prepared by RF magnetron reaction sputtering technique and thermal annealing. The composition, structure and optical band gap of the films were characterized by energy dispersive spectrometer （EDS） and X-ray diffraction （XRD）. The nonlinear optical properties of ncSi-SiNx composite films were investigated by using single beam Z-scan technique with a picosecond pulses laser. The measured third-order nonlinear optical refractive index and nonlinear absorption coefficient are enhanced and estimated to be on the order of 10-s esu and 10-8 m/W respectively. This is due to the quantum confinement effect.
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Top-emitting organic light-emitting devices based on silicon substrate using Delta -doping technique
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