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Growth of Copper Films via Plasma Enhanced Atomic Layer Deposition
  • 所属机构名称：北京印刷学院
  • 会议名称：2nd International Conference on ALD Applications & 3rd China ALD conference?
  • 时间：2014.10.14
  • 成果类型：会议
  • 相关项目：磁场辅助等离子体增强原子层沉积技术中的物理问题研究
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磁场辅助等离子体增强原子层沉积技术中的物理问题研究
期刊论文 45 会议论文 24
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