位置：成果数据库 > 会议 > 会议详情页
The Influence of ALD Al2O3 Process Parameters on Modified SnO2 Photoanode of Dye-Sensitized Solar Ce
  • 所属机构名称：北京印刷学院
  • 会议名称：ALD2014
  • 时间：2014.6.16
  • 成果类型：会议
  • 相关项目：磁场辅助等离子体增强原子层沉积技术中的物理问题研究
同会议论文项目
磁场辅助等离子体增强原子层沉积技术中的物理问题研究
期刊论文 45 会议论文 24
同项目会议论文
氢等离子体辅助原子层沉积铜薄膜的研究
ALD of Manganese Silicate
Growth of Copper Films via Plasma Enhanced Atomic Layer Deposition
Plasma Enhanced Atomic Layer Deposition ofCopper Thin Film using [Cu(iPr-amd)]2 as Precursor
自组装单分子膜为钝化层实现选择性原子层沉积氧化锌的研究
热原子层沉积与等离子体辅助原子层沉积氧化铝薄膜的比较
螺旋波等离子体源放电特性诊断
Investigation of the remote ECR plasma-assisted atomic layer deposition metal Al thin films
Area-Selective Atomic Layer Deposition of Al2O3/ZnO Using Self-Assembled Monolayer
Comparison of thermal and plasma-enhanced ALD Al2O3 With  different oxidant sources on the
Performance Of Helicon Plasma Under Two Kinds Of Top Plates
Investigation of the remote ECR plasma-assisted atomic layer deposition metal Al thin films
原子层沉积(ALD)技术及其应用
Growth of Copper Films via Plasma Enhanced Atomic Layer Deposition
The ALD ZnO Coating As Inverted Organic Solar Cell Buffer Layer
Growth of Copper Films via Plasma Enhanced Atomic Layer Deposition
Area-Selective Atomic Layer Deposition of Al2O3/ZnO Using Self-Assembled Monolayer
 The ALD ZnO Coating As Inverted Organic Solar Cell Buffer Layer
热原子层沉积与等离子体辅助原子层沉积氧化铝薄膜的比较
等离子体辅助原子层沉积(PEALD)技术在太阳电池中的应用
ALD ZnO to Modify ITO for High Efficient Inverted Polymer Solar Cells
The Study of Low-Field Density Peak in Helicon Plasma
Mode transitions of a Helicon Plasma Source in small Magnetic Fields