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原子层沉积(ALD)技术及其应用
  • 所属机构名称：北京印刷学院
  • 会议名称：第十四届全国固体薄膜学术会议
  • 时间：2014.7.29
  • 成果类型：会议
  • 相关项目：磁场辅助等离子体增强原子层沉积技术中的物理问题研究
同会议论文项目
磁场辅助等离子体增强原子层沉积技术中的物理问题研究
期刊论文 45 会议论文 24
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氢等离子体辅助原子层沉积铜薄膜的研究
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Area-Selective Atomic Layer Deposition of Al2O3/ZnO Using Self-Assembled Monolayer
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热原子层沉积与等离子体辅助原子层沉积氧化铝薄膜的比较
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