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Flattening of low temperature epitaxial Ge1-xSnx/Ge/Si(100) alloys via mass transport during post-gr
ISSN号:0169-4332
期刊名称:Applied Surface Science
时间:0
页码:4468-4471
相关项目:Si/Ge长波长单光子探测器基础研究
作者:
Wang, Wei|Su, Shaojian|Zheng, Jun|Zhang, Guangze|Xue, Chunlai|Zuo, Yuhua|Cheng, Buwen|Wang, Qiming|
同期刊论文项目
Si/Ge长波长单光子探测器基础研究
期刊论文 32
专利 2
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