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Theoretical investigation of sheath expansion and implant fluence uniformity in enhanced glow discha
  • ISSN号：0003-6951
  • 期刊名称：Applied Physics Letters
  • 时间：0
  • 页码：091501-1-091501-3
  • 语言：英文
  • 相关项目：一种等离子体基离子注入/沉积新方法的基本理论和技术研究
作者： Lu, Qiu Yuan|Li, Liu He|Kwok, Dixon T. K.|Chu, Paul K.|Fu, Ricky K. Y.|
同期刊论文项目
一种等离子体基离子注入/沉积新方法的基本理论和技术研究
期刊论文 15 会议论文 3 获奖 2
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