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中文摘要：
研究利用原子层沉积获得的小于10 nm Al_2O_3薄膜表面形貌特点。采用该技术获得4和8 nm的Al_2O_3薄膜,利用原子力扫描电镜（AFM）和扫描电镜（SEM）对薄膜表面形貌进行测量,通过最小二乘法和多重分形研究薄膜表面形貌,分析得出利用原子层沉积技术加工超薄Al_2O_3薄膜,其形貌与成膜原理有关,与厚度无关。
英文摘要：
The surface morphology characteristics of Al2O3 film with thickness less than 10 nm fabricated by atomic layer deposition （ALD） were studied and 4 nm and 8 nm thick Al2O3 thin films were obtained by ALD. The surface morphology of the film was measured by atomic force microscopy （AFM） and scanning electron microscopy （SEM）. By the least squares method and multi-fractal, the surface morphology of film was studied. Results show that the film morphology has a correlation with the principle of generated films rather than the thickness.
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Fabrication of nanoscale step height structure using atomic layer deposition combined with wet etchi
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