中文摘要：

使用尿素-NaBr-KBr-甲酰胺镀液用电沉积方法在硅基体上沉积出含有金属镧的沉积膜，研究了沉积液中甲酰胺的含量和电流密度等工艺参数对沉积膜的形貌和金属La含量的影响．结果表明，在适当的沉积条件下，沉积膜由金属镧及少量氧化镧组成，呈白灰色、均匀、致密、光滑，La的含量（质量分数）达到91．35％；电流密度过低或过高都使沉积膜的表面形态呈现灰黑色、疏松和粗糙．沉积膜中金属镧的含量先随着电流密度的增大而提高，后又降低．镀液中适当含量的甲酰胺使其呈现较好的流动状态，有利于制备高质量的沉积膜．用聚乙烯醇保护膜可以使沉积膜免于氧化．

英文摘要：

The rare earth metal La film on Si substrate was fabricated by electrodeposition in urea- NaBr-KBr-formamide solution under isolation of oxygen. The effects of the concentration of formamide and the current density on the morphology and La content of the deposited film were investigated. The results show that the deposited film contains metal La mainly （91.35%） and a few La2O3, chlorin and bromine. The film is dense, homogeneity and smooth with light grey colour. Too low or too high current density leads to dark grey, porous and rough deposited film, The La content in the film increases and then decreases as the current density increases, A proper content formamide in the solution keeps a good fluidity of the solution and is good for fabrication of high quality film, A polyvinyl alcohol film deposited on the La film has protection from oxidation.