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Study on the Growth of Crystalline Er O Films on Si Substrates byRHEED Patterns
  • ISSN号：0878-492569
  • 期刊名称：Key Engineering Materials
  • 时间：2011.6.6
  • 页码：163-166
  • 相关项目：非晶Er2O3选择性发射体兼减反射薄膜的物理特性研究
作者： Yanyan Zhu, Run Xu, Zebo Fang|
同期刊论文项目
非晶Er2O3选择性发射体兼减反射薄膜的物理特性研究
期刊论文 22
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