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A model for the frequency dispersion of the high-k metal-oxide-semiconductor capacitance in accumula
  • ISSN号：0003-6951
  • 期刊名称：Applied Physics Letters
  • 时间：2012.5.5
  • 页码：2229031-2229032
  • 相关项目：非晶Er2O3选择性发射体兼减反射薄膜的物理特性研究
作者： B. Yao|Z. B. Fang|Y. Y. Zhu|T. Ji|G. He|
同期刊论文项目
非晶Er2O3选择性发射体兼减反射薄膜的物理特性研究
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