硅基太阳能电池的关键技术之一是在硅表面制备高效减反射结构,化学刻蚀法是制备减反射结构的最常用方法,其研究热点为贵金属辅助化学刻蚀技术,综述了化学刻蚀硅制备太阳能电池减反射结构的主要方法、刻蚀机理、工艺特征及应用等的研究进展,重点介绍了贵金属辅助化学刻蚀技术的最新研究成果.
The research of the silicon solar cells mainly focuses on reducing cost and improving conversion efficiency,and one of the effective methods of reducing the photoelectric conversion efficiency of the solar cells is to decrease the reflection of incident sunlight onto the light-receiving surface.Preparation antireflection structure is an important step in the preparation of silicon-based solar cell.Wet chemical etching is the most common method to produce antireflection structure due to its simple and low cost process.The latest progress in the preparation of antireflection structure via chemical etching silicon is reviewed,focusing on the main etching method,etching mechanism,process characteristics and applications.