研究了热丝化学气相沉积法(HFCVD)制备得到钽衬底掺硼金刚石膜电极(Ta/BDD)的物理性质和电势窗口,并考察了其用于电化学催化氧化硝基酚过程中的性能及各种影响因素.扫描电镜和拉曼光谱表明,Ta/BDD电极具有良好的物理性能,通过测试Ta/BDD电势窗口发现,该电极具有较高的析氧过电位.在Ta/BDD电化学催化氧化硝基酚过程中,化学需氧量(COD)和高效液相色谱测试表明,硝基酚能够有效降解,电流密度、支持电解液及浓度对降解过程影响较大,温度影响不明显.强化寿命实验表明,Ta/BDD电极具有较好的稳定性.实验结果表明,Ta/BDD电极是一种适于硝基酚降解和COD去除的优良电极.
The physical and electrochemical behaviors of the tantalum substrate born-doped diamond (Ta/BDD) electrode prepared by hot filament chemical vapor deposition (HFCVD) technique and its application in electrochemical oxidation of wastewater containing nitrophenol were studied. Raman spectroscopy and scanning electron microscopy (SEM) examinations demonstrated that the electrode had well-defined diamond features. It was observed that the Ta/ BDD electrode had a much higher overpotential for water electrolysis prohibiting the evolution of oxygen in the cyclic voltammetry test. During the electrochemical oxidation of wastewater containing nitrophenol, the results obtained by high performance liquid chromatography (HPLC) and chemical oxygen demand (COD) tests showed that the electrochemical process was suitable for completely degrading nitrophenol. The influence of current density, temperature, support electrolyte, and electrolyte concentration was investigated in order to find the best conditions for COD removal. Good electrochemical stability of Ta/BDD electrode was obtained in the accelerated life test. According to the results, Ta/BDD anode is consitered to be a unique electrode for the degradation of nitrophenol and COD simultaneously.